Method and device for determining layout analysis model, electronic equipment and storage medium

The embodiment of the invention discloses a layout analysis model determination method and device, electronic equipment and a medium. Based on a pre-trained layout analysis model, determining at least one layout pseudo tag of the unmarked layout sample, and obtaining a candidate pseudo tag sample wi...

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Hauptverfasser: ZHOU YANJI, ZHONG RONGFU, XIAO XUELI, DAI XILIANG, LIAO CHANGHUI, CHEN GUOHUA, DENG YIN, SHAO XIANGCHAO, LIU GUANKE, XIE JIEFANG, LI HUIYI, LENG YINGXIONG, YE HAIZHEN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The embodiment of the invention discloses a layout analysis model determination method and device, electronic equipment and a medium. Based on a pre-trained layout analysis model, determining at least one layout pseudo tag of the unmarked layout sample, and obtaining a candidate pseudo tag sample with the layout pseudo tag; for each type of layout pseudo label, based on an initial feature extraction model of the layout pseudo label, determining a hyper-sphere center corresponding to the layout pseudo label, and determining a target hyper-sphere radius of the layout pseudo label according to the marked layout sample and the hyper-sphere center corresponding to the layout pseudo label; according to the target hypersphere radius of the layout pseudo tag, screening a target pseudo tag sample from candidate pseudo tag samples corresponding to the layout pseudo tag; and training the pre-trained layout analysis model according to the target pseudo label samples of the various layout pseudo labels to obtain a target