Method and device for correcting field curvature of microscope
The invention discloses a field curvature correction method and device for a microscope, and the method comprises the steps: placing a standard workpiece on a bearing platform, and enabling the standard workpiece to have a standard surface; the standard plane is located on the focal plane of the mic...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a field curvature correction method and device for a microscope, and the method comprises the steps: placing a standard workpiece on a bearing platform, and enabling the standard workpiece to have a standard surface; the standard plane is located on the focal plane of the microscope objective; the image plane of the standard plane is taken as an initial image plane, a plurality of initial imaging points in the initial image plane are acquired, the spatial position coordinates of the plurality of initial imaging points are taken as a plurality of first coordinates, and the plurality of initial imaging points are in one-to-one correspondence with the to-be-measured points in the standard plane; mapping the plurality of initial imaging points to a reference plane and obtaining a plurality of target imaging points matched with the plurality of initial imaging points, wherein the plurality of target imaging points are in one-to-one correspondence with the plurality of initial imaging points |
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