Ion source control system and method and coating equipment

The invention discloses an ion source control system and method and coating equipment, and relates to the technical field of plasmas, the ion source control system is connected with an ion source body installed in a vacuum cavity of the coating equipment, and the ion source body comprises a discharg...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JIANG YOUSONG, WANG HUAIMIN, GU KANGXIN, ZHENG BINGWEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONTROLLING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS REGULATING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:	The invention discloses an ion source control system and method and coating equipment, and relates to the technical field of plasmas, the ion source control system is connected with an ion source body installed in a vacuum cavity of the coating equipment, and the ion source body comprises a discharge chamber, an RF antenna, an accelerating electrode and a screen grid electrode; the ion source control system comprises a gas supply control assembly used for controlling the gas flow in the ion source body; the gas supply control assembly is provided with a gas inlet pipe of which the outlet end is positioned in the discharge chamber; the power supply control assembly is used for controlling generation and extraction of plasmas in the ion source body; the power supply control assembly is connected with the RF antenna, the accelerating electrode and the screen grid electrode. According to the ion source control system and method and the coating equipment provided by the specification, the plasma energy and the ion