High-resolution reconstruction method for lamellar microstructure modeling

The invention provides a high-resolution reconstruction method for lamellar microstructure modeling, and relates to the technical field of metal structure reconstruction. The method comprises the following steps: performing morphology and EBSD representation on a metal material to obtain the lamella...

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Hauptverfasser: WANG WENXIN, LIU YUJIE, HUANG XUTAO, WANG JIANJUN, CHEN YINPING, LU GANG, LIU CHUNMING
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a high-resolution reconstruction method for lamellar microstructure modeling, and relates to the technical field of metal structure reconstruction. The method comprises the following steps: performing morphology and EBSD representation on a metal material to obtain the lamellar thickness and the average grain size of the metal material, writing a microstructure reconstruction program based on a space segmentation algorithm and a lamellar division algorithm, and establishing a microstructure reconstruction model; a three-dimensional reconstruction model closest to a real microstructure is obtained by adjusting control parameters in a reconstruction program, namely lamellar orientation, grain distribution and iteration times; according to the method, the lamellar microstructure can be quickly and accurately reconstructed, and meanwhile, the generated microstructure model is high in compatibility and can be transplanted to finite element software for simulation analysis. 本发明提供一种用于片层状微观结构建模