Precursor delivery system and method thereof

A semiconductor processing system for delivering high volumes of vaporized precursors from a solid or liquid precursor source is disclosed. The system utilizes a carrier gas to supply vaporized precursors to a remotely located processing zone in which a plurality of processing modules are disposed....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WINKLER JERRY L, SHERO ERIC JAMES
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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