Precursor delivery system and method thereof

A semiconductor processing system for delivering high volumes of vaporized precursors from a solid or liquid precursor source is disclosed. The system utilizes a carrier gas to supply vaporized precursors to a remotely located processing zone in which a plurality of processing modules are disposed....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WINKLER JERRY L, SHERO ERIC JAMES
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A semiconductor processing system for delivering high volumes of vaporized precursors from a solid or liquid precursor source is disclosed. The system utilizes a carrier gas to supply vaporized precursors to a remotely located processing zone in which a plurality of processing modules are disposed. The system includes first and second buffer volumes configured to reduce the pressure drop and increase the delivery rate. Also disclosed is a method for delivering a high volume evaporation precursor to a remotely located processing zone. 公开了一种用于从固体或液体前体源输送大容量蒸发前体的半导体处理系统。该系统利用载气将蒸发前体供给到远程定位处理区，在该处理区中设置有多个处理模块。该系统包括第一和第二缓冲容积，其配置成减少压降并增加输送速率。还公开了一种用于将大容量蒸发前体输送到远程定位处理区的方法。