Galvanometer local correction compensation method based on double galvanometer lenses
The invention relates to the technical field of galvanometer correction, in particular to a galvanometer local correction compensation method based on double galvanometer lenses, which comprises the following steps of: performing original correction by adopting a double-galvanometer lens association...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of galvanometer correction, in particular to a galvanometer local correction compensation method based on double galvanometer lenses, which comprises the following steps of: performing original correction by adopting a double-galvanometer lens association mode, correcting a left lens, correcting a complete right lens by taking the center of a corrected left lens array as a reference point, and correcting the right lens by taking the center of a corrected right lens array as a reference point; enabling the original correction file to appear in a double-end spliced whole; when local correction is carried out, firstly, an original correction file is imported, an original array is displayed, and then the original array is cut into equal intervals according to the distortion breadth range actually measured by the clamping plate; a plurality of dot matrixes exist in the equally-divided interval, the dot matrixes are edited for offset compensation, a new correction compen |
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