Wavelet system and method for improving misalignment and asymmetry of semiconductor devices

A wavelet analysis system and method for manufacturing a wafer of a semiconductor device, the system comprising: a misalignment metrology tool operable to measure at least one measurement site on the wafer to produce an output signal; and a wavelet-based analysis engine operable to generate at least one wavelet-transformed signal by applying at least one wavelet transform to the output signal, and to generate a quality metric by analyzing the wavelet-transformed signal. 本发明公开一种用于制造半导体装置晶片的小波分析系统及方法，所述系统包含：不对齐计量工具，其可操作以测量晶片上的至少一个测量位点，从而产生输出信号；以及基于小波的分析引擎，其可操作以通过将至少一个小波变换应用于所述输出信号来产生至少一个经小波变换信号，且通过分析所述经小波变换信号来产生质量度量。