Composite plasma cleaning method
The invention discloses a composite plasma cleaning method. The composite plasma cleaning method comprises the following steps that S1, a workpiece is placed on a workpiece frame in a vacuum chamber; s2, vacuumizing the vacuum chamber; s3, the vacuum chamber is filled with inert gas, so that the air...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a composite plasma cleaning method. The composite plasma cleaning method comprises the following steps that S1, a workpiece is placed on a workpiece frame in a vacuum chamber; s2, vacuumizing the vacuum chamber; s3, the vacuum chamber is filled with inert gas, so that the air pressure in the vacuum chamber is at the working pressure at which bias glow cleaning and ion beam cleaning can work; and S4, turning on the bias power supply and the ion beam source to perform bias glow cleaning and ion beam cleaning on the workpiece in the vacuum chamber at the same time. Bias glow cleaning and ion beam cleaning are combined to synchronously clean the workpiece in the vacuum chamber, the advantages of the two cleaning modes can be perfectly combined, the defects of the two cleaning modes can be complemented, and large-area and large-scale cleaning and local directional cleaning can be effectively combined, so that the cleaning effect can be improved, and the cleaning efficiency is improved. And |
---|