Semiconductor micro-acoustic device manufacturing method and device and semiconductor micro-acoustic device

The invention relates to the field of semiconductor devices, and provides a semiconductor micro-acoustic device manufacturing method and device and a semiconductor micro-acoustic device.The method comprises the steps that the first rotation angle of a micro-acoustic substrate is determined according to the change of excitation intensity of a first mode within a first range caused by the rotation angle change of the Euler angle of the micro-acoustic substrate; determining a first precession angle of the micro-acoustic substrate according to the change of the excitation intensity of the first mode in a second range caused by the precession angle change of the Euler angle of the micro-acoustic substrate; and determining an optimal Euler angle according to the first rotation angle and the first precession angle, manufacturing a micro-acoustic substrate according to the optimal Euler angle, and manufacturing a metal interdigital electrode by adopting a semiconductor process to obtain the semiconductor micro-acoust