Radiation enhancement method based on non-uniform plasma

The invention discloses a non-uniform plasma-based radiation enhancement method, and relates to a plasma enhancement method. The method aims at overcoming the defects that an existing plasma enhancement technology is simple in physical model and lacks general discussion that non-uniform plasmas are...

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Bibliographische Detailangaben
Hauptverfasser: YAN CHANGSHI, WANG MIN, AI XIN, QIAN LIANG, HUA YANGYANG, NIE QIUYUE, CHEN PEIQI, ZHANG ZHONGLIN, WEI GUOQIANG, MENG ZHUOTAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a non-uniform plasma-based radiation enhancement method, and relates to a plasma enhancement method. The method aims at overcoming the defects that an existing plasma enhancement technology is simple in physical model and lacks general discussion that non-uniform plasmas are used for achieving optimal enhancement, and the method is achieved based on a plasma enhancement type electrically small antenna. The plasma enhanced electrically small antenna comprises a spherical shell-shaped plasma cover and an electrically small antenna located in the plasma cover. Plasmas in the plasma cover are non-uniformly distributed along the radius of the plasma cover; the radiation enhancement method comprises the following steps: adjusting the plasma density and the size of the plasma cover to meet the following conditions, so that the radiation of the non-uniform plasma on the electrically small antenna is enhanced. 本发明的一种基于非均匀等离子体的辐射增强方法,涉及等离子体增强方法。目的是为了克服现有等离子体增强技术物理模型较为简单,缺少利用非均匀等离子体实现最佳增强的一般性讨论,方