Heterostructured material contacts for 2D transistors
Transistors, devices, systems, and methods are discussed relative to transistors including a 2D material channel and a heterogeneous 2D material on the 2D material channel and coupled to source and drain metals, and fabrication thereof. The 2D material channel of the transistor allows gate length sc...
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Format: | Patent |
Sprache: | chi ; eng |
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