Exposure machine
The exposure machine is provided with a bearing table, a light source and a projection system, an energy conversion part is further arranged in the exposure machine, and the energy conversion part is used for receiving light waves emitted by the light source and converting the light waves into first...
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| creator | CHEN LIXUAN DUAN MIAO LI LINSHUANG ZHU QINFU |
| description | The exposure machine is provided with a bearing table, a light source and a projection system, an energy conversion part is further arranged in the exposure machine, and the energy conversion part is used for receiving light waves emitted by the light source and converting the light waves into first electromagnetic waves before the light waves emitted by the light source enter the projection system. The wavelength of the first electromagnetic wave is greater than 760 nm and less than 1000 nm; and/or a baking module is also arranged in the exposure machine, the baking module is used for emitting a second electromagnetic wave to the bearing table, and the wavelength of the second electromagnetic wave is greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic wave is greater than 1 mm and less than 1 m. The first electromagnetic wave and the second electromagnetic wave can bake the glass substrate. According to the exposure machine, the energy conversion piece or the baking mod |
| format | Patent |
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The wavelength of the first electromagnetic wave is greater than 760 nm and less than 1000 nm; and/or a baking module is also arranged in the exposure machine, the baking module is used for emitting a second electromagnetic wave to the bearing table, and the wavelength of the second electromagnetic wave is greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic wave is greater than 1 mm and less than 1 m. The first electromagnetic wave and the second electromagnetic wave can bake the glass substrate. 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The wavelength of the first electromagnetic wave is greater than 760 nm and less than 1000 nm; and/or a baking module is also arranged in the exposure machine, the baking module is used for emitting a second electromagnetic wave to the bearing table, and the wavelength of the second electromagnetic wave is greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic wave is greater than 1 mm and less than 1 m. The first electromagnetic wave and the second electromagnetic wave can bake the glass substrate. 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The wavelength of the first electromagnetic wave is greater than 760 nm and less than 1000 nm; and/or a baking module is also arranged in the exposure machine, the baking module is used for emitting a second electromagnetic wave to the bearing table, and the wavelength of the second electromagnetic wave is greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic wave is greater than 1 mm and less than 1 m. The first electromagnetic wave and the second electromagnetic wave can bake the glass substrate. According to the exposure machine, the energy conversion piece or the baking mod</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Exposure machine |
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