Exposure machine

Exposure machine

The exposure machine is provided with a bearing table, a light source and a projection system, an energy conversion part is further arranged in the exposure machine, and the energy conversion part is used for receiving light waves emitted by the light source and converting the light waves into first...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHEN LIXUAN, DUAN MIAO, LI LINSHUANG, ZHU QINFU
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The exposure machine is provided with a bearing table, a light source and a projection system, an energy conversion part is further arranged in the exposure machine, and the energy conversion part is used for receiving light waves emitted by the light source and converting the light waves into first electromagnetic waves before the light waves emitted by the light source enter the projection system. The wavelength of the first electromagnetic wave is greater than 760 nm and less than 1000 nm; and/or a baking module is also arranged in the exposure machine, the baking module is used for emitting a second electromagnetic wave to the bearing table, and the wavelength of the second electromagnetic wave is greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic wave is greater than 1 mm and less than 1 m. The first electromagnetic wave and the second electromagnetic wave can bake the glass substrate. According to the exposure machine, the energy conversion piece or the baking mod