Extreme ultraviolet multilayer film reflector and preparation method thereof

The invention discloses an extreme ultraviolet multilayer film reflector and a preparation method thereof. The reflector comprises a substrate and an N-layer co-sputtering film structure, the first layer of co-sputtering film structure is arranged on the substrate, and the (i + 1) th layer of co-sputtering film structure is arranged on the ith layer of co-sputtering film structure; each layer of co-sputtering film structure comprises an absorption layer and a spacing layer, and the spacing layer is arranged on the upper side of the absorption layer; the absorption layer is prepared by co-sputtering two target materials of Mo and Nb; and the spacing layer is prepared by co-sputtering two target materials of Si and Y, or prepared by sputtering a Si target material. Compared with the existing reflector formed based on Mo/Si and Nb/Si, the reflector prepared by the invention has better optical performance. 本发明公开一种极紫外多层膜反射镜及制备方法，反射镜包括：基底和N层共溅射膜结构；第一层共溅射膜结构设置在所述基底上，第i+1层共溅射膜结构设置在第i层共溅射膜结构上；各层共溅射膜结构均包括：吸收层和间隔层，所述间隔层