Atomic layer deposition multi-cavity single power supply control system

The invention relates to the technical field of semiconductor manufacturing, in particular to an atomic layer deposition three-cavity single-power-supply control system. The invention provides an atomic layer deposition multi-cavity single-power-supply control system, which comprises a control modul...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIANG HEMING, ZHANG SAIQIAN, MAO PENGFEI, CHEN YAQI, MEI SHENGLI, WU JIE, WANG TIESHUANG, DENG LEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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