Atomic layer deposition multi-cavity single power supply control system

The invention relates to the technical field of semiconductor manufacturing, in particular to an atomic layer deposition three-cavity single-power-supply control system. The invention provides an atomic layer deposition multi-cavity single-power-supply control system, which comprises a control module, a radio frequency power supply, a radio frequency impedance, a plurality of solid-state relays and corresponding radio frequency loops and reaction cavities, wherein the control module is used for switching on or off the solid-state relays; the control module is used for controlling the on-off frequency of a switch of the solid-state relay, setting an energy supply time period according to an atomic layer deposition process, and providing radio frequency energy for each radio frequency loop in a time-sharing sequence; and the radio frequency loop provides radio frequency energy for the corresponding reaction cavity by utilizing the on-off of the solid-state circuit breaker so as to carry out an atomic layer depo