Novel mask

The invention provides a novel mask. The novel mask comprises a base layer and a functional layer, the base layer and the functional layer are laminated; the material of the functional layer comprises a material with viscosity after the temperature rises; one side, close to the functional layer, of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	CAI YONG'AN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides a novel mask. The novel mask comprises a base layer and a functional layer, the base layer and the functional layer are laminated; the material of the functional layer comprises a material with viscosity after the temperature rises; one side, close to the functional layer, of the base layer is a release surface; the absorption coefficient of the base layer is greater than or equal to 20% when the thickness is less than 200 microns under the irradiation of an ultraviolet light source, and the wavelength of the ultraviolet light source is 355 +/-15 nm; or, the absorption coefficient of the base layer is larger than or equal to 20% when the base layer is irradiated by a green light source and the thickness is smaller than 200 microns, and the wavelength of the green light source is 530 +/-15 nm; or, the absorption coefficient of the base layer is larger than or equal to 20% when the base layer is irradiated by an infrared light source and the thickness is smaller than 200 microns, and the