Layout splitting method and computer medium
The invention relates to the technical field of photoetching, in particular to a layout splitting method and a computer medium, and the splitting method comprises the following steps: obtaining an initial layout, and dividing the obtained initial layout into a plurality of preset plates in a preset...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of photoetching, in particular to a layout splitting method and a computer medium, and the splitting method comprises the following steps: obtaining an initial layout, and dividing the obtained initial layout into a plurality of preset plates in a preset mode; judging and defining the preset plate according to the spatial layout; reconstructing the preset plate based on a defined result by adopting a preset arrangement mode to obtain a reconstructed layout; coloring, splitting and grouping preset plates of the reconstructed layout based on a preset standard; and performing preset arrangement based on the grouping result to obtain a demand layout. By segmenting, reconstructing and grouping the initial layout, the gap of the initial layout is enlarged, and the space period is doubled, so that the obtained required layout can realize pattern transfer, the work is more facilitated, the consistency and stability of splitting and the processing speed are improved, and me |
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