Reticle and method of forming pattern in semiconductor device using same

A reticle and a method of forming a pattern in a semiconductor device using the same are provided. The mask comprises: a mask substrate; the reflecting layer is positioned on the mask substrate; and a mask pattern on the reflective layer and having image patterns for absorbing light and a first pattern between the image patterns, the first pattern being an opening and having a honeycomb arrangement in a top view, the seven first patterns are arranged at respective vertices and centers of a first regular hexagon, and each of the first patterns has a shape of a second regular hexagon rotated 90 degrees with respect to the first regular hexagon. 提供了掩模版和使用该掩模版形成半导体器件中的图案的方法。所述掩模版包括：掩模基板；反射层，所述反射层位于所述掩模基板上；以及掩模图案，所述掩模图案位于所述反射层上，并且具有用于吸收光的图像图案和位于所述图像图案之间的第一图案，所述第一图案是开口，并且在俯视图中具有蜂窝状排列，使得七个所述第一图案布置在第一正六边形的相应的顶点和中心处，并且每个所述第一图案具有相对于所述第一正六边形旋转90度的第二正六边形的形状。