Ternary precursor and preparation method and application thereof
The invention provides a ternary precursor as well as a preparation method and application thereof, the preparation method comprises the following steps: (1) mixing alkali liquor, a complexing agent and a solvent to obtain a base solution, placing the base solution in a reactor A, and introducing ga...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a ternary precursor as well as a preparation method and application thereof, the preparation method comprises the following steps: (1) mixing alkali liquor, a complexing agent and a solvent to obtain a base solution, placing the base solution in a reactor A, and introducing gas to the bottom of the reactor A to enable the base solution to circularly flow; (2) continuously introducing gas, and adding a metal salt solution, alkali liquor and a complexing agent into the reactor A to obtain reactant slurry; (3) continuously introducing gas, discharging the reactant slurry into a concentrator B from the reactor A, discharging part of clear liquid, then feeding the reactant slurry into the reactor A again, enabling particles to grow to a target particle size, and carrying out centrifuging, washing and drying treatment to obtain the ternary precursor; wherein the ventilation method comprises the step of introducing gas into the reactor A through the gas distributor. According to the invention, |
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