Device and method suitable for SF6 purification equipment and used for removing C2F6 in SF6 gas
The device comprises an adsorption tower and electrode plates, the electrode plates are located on the two sides of the outer portion of the adsorption tower, the adsorption tower comprises a tower body and a flow guide plate, a gas inlet is formed in the top end of the tower body, a gas outlet is f...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The device comprises an adsorption tower and electrode plates, the electrode plates are located on the two sides of the outer portion of the adsorption tower, the adsorption tower comprises a tower body and a flow guide plate, a gas inlet is formed in the top end of the tower body, a gas outlet is formed in the bottom end of the tower body, and the flow guide plate is located between the gas inlet and the gas outlet. One sides of the flow guide plates are connected to the inner wall of the tower body at intervals in the length direction of the tower body, and gas circulation gaps are formed between the other sides of the flow guide plates and the inner wall of the tower body and are alternately arranged on the two sides. The invention further discloses a method for removing C2F6 in SF6 gas suitable for the SF6 purification equipment, and the method has the beneficial effects that the electrode plate applies an electric field to polarize C2F6 molecules, so that the orientation force and the induction force of |
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