Thin film, preparation method of thin film, photoelectric device and display panel
The invention discloses a thin film, a preparation method of the thin film, a photoelectric device and a display panel, the thin film comprises a first sub-film layer and a second sub-film layer which are stacked, the first sub-film layer is made of a first electron transport material, the second su...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a thin film, a preparation method of the thin film, a photoelectric device and a display panel, the thin film comprises a first sub-film layer and a second sub-film layer which are stacked, the first sub-film layer is made of a first electron transport material, the second sub-film layer is made of a second electron transport material, the first sub-film layer is doped with hydrogen ions, and the second sub-film layer is doped with hydrogen ions. Therefore, the working performance of the photoelectric device is improved, and the service life of the photoelectric device is prolonged. The preparation method of the thin film comprises the following steps: preparing the first electron transport material layer; injecting hydrogen ions into the first electron transport material layer to obtain a first sub-film layer; and preparing the second electron transport material layer on the first sub-film layer to obtain the second sub-film layer. The method has the advantages of simple operation and |
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