NOZZLE-TYPE DEPOSITION APPARATUS
The present invention relates to a nozzle-type deposition apparatus, and more particularly, to a nozzle-type deposition apparatus, which can minimize the amount of raw material used for depositing a pattern by supplying the raw material for depositing the pattern as required to the pattern depositio...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a nozzle-type deposition apparatus, and more particularly, to a nozzle-type deposition apparatus, which can minimize the amount of raw material used for depositing a pattern by supplying the raw material for depositing the pattern as required to the pattern deposition, and can perform accurate pattern deposition by supplying the raw material only at a site where the pattern needs to be formed, and prevent the diffusion of the raw material, thereby improving the deposition efficiency. The nozzle-type deposition device can fundamentally prevent deposition of raw materials on other parts, can prevent blockage of a discharge pipe and a nozzle for supplying the raw materials by using a heating gas, and can simply and effectively form the deposition device by supplying the raw materials in a nozzle manner.
本发明涉及喷嘴型沉积装置,更详细地,涉及将用于沉积图案的原料按所需提供到图案沉积,并进行沉积可最小化原料的使用量,并且根据仅在需形成图案的部位供给原料,从而可进行精确的图案沉积,并且防止原料的扩散,可从根源上防止原料沉积到其他部位,利用加热气体可防止供给原料的排管及喷嘴的堵塞,并且根据以喷嘴方式供给原料,从而可简易并有效地构成沉积装置的喷嘴型沉积装置。 |
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