ELECTRONIC APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND OPERATING METHOD OF ELECTRONIC APPARATUS

Disclosed is an operation method of an electronic apparatus, the operation method including: receiving a design layout for manufacturing a semiconductor device; generating a first layout by performing machine learning based process proximity correction (PPC); generating a second layout by performing optical proximity correction (OPC); and outputting the second layout for a semiconductor process. Generating the first layout includes: generating a first post-clean inspection (ACI) layout by performing a machine learning based process proximity correction module on a design layout; generating a second post-cleaning check layout by adjusting the design layout based on a difference between the first post-cleaning check layout and the design layout and performing a process proximity correction module on the adjusted layout; and outputting the adjusted layout as the first layout when a difference between the second post-cleaning check layout and the design layout is less than or equal to a threshold value. 公开了一种电子设备