Pattern matching device, pattern measuring system, and pattern matching program

The present disclosure proposes a pattern matching device capable of implementing a matching process with a learning function as a feature, especially in a semiconductor pattern including a repeated pattern. This pattern matching device is provided with a learning unit that estimates, as pixel value...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ABE YUICHI, NAGATOMO WATARU, LI LIANG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present disclosure proposes a pattern matching device capable of implementing a matching process with a learning function as a feature, especially in a semiconductor pattern including a repeated pattern. This pattern matching device is provided with a learning unit that estimates, as pixel values, a first correlation image having a numerical value indicating a correlation between a first image and a second image. The pattern matching device calculates a second correlation image having a numerical value representing a correlation between a derived image generated from the first image and the first image as a pixel value, and the learner performs learning so as to reduce a difference between the first correlation image and the second correlation image (referring to Figure 1). 本公开提出一种图案匹配装置,特别是即使在包含重复图案的半导体图案中,也能够实现将具有学习功能作为特征的匹配处理。本公开的图案匹配装置具备学习器,该学习器推定具有表示第一图像与第二图像之间的相关性的数值作为像素值的第一相关图像,所述图案匹配装置计算具有表示从所述第一图像生成的派生图像与所述第一图像之间的相关性的数值作为像素值的第二相关图像,所述学习器以减小所述第一相关图像与所述第二相关图像之间的差分的方式进行学习(参照图1)。