Nanopore cell with seamless working electrode and method of forming same

The invention relates to a nanopore cell. The nanopore cell may include a well having a seamless porous electrode and a hydrophobic sidewall. The seamless porous electrode may be formed by depositing a porous electrode material on a planar electrode support layer formed from conductive layer islands and a dielectric layer. The porous electrode material may form a uniform seamless column and may be protected during manufacture by depositing a selectively removable protective layer on the seamless column. The well may be formed by forming a hydrophobic cladding over a protective layer and then patterning the hydrophobic cladding. The protective layer may be removed to expose the seamless porous electrode at the bottom of the well. 本发明涉及一种纳米孔单元，所述纳米孔单元可以包括具有无缝多孔电极和疏水性侧壁的阱。所述无缝多孔电极可以通过在由导电层岛和电介质层形成的平面电极支撑层上沉积多孔电极材料来形成。所述多孔电极材料可以形成均匀的无缝柱，并且可以在制造期间通过在所述无缝柱上沉积可选择性去除的保护层而受到保护。可以通过在保护层之上形成疏水性包层并随后将所述疏水性包层图案化来形成所述阱。可以除去所述保护层以暴露所述阱的底部处的无缝多孔电极。