Photoelectric sensor, forming method thereof and electronic equipment

The invention discloses a photoelectric sensor, a forming method thereof and electronic equipment, and the forming method comprises the steps: providing a substrate which is provided with a first surface; the substrate comprises a pixel region, and the pixel region comprises a plurality of sub-pixel...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CUI QIANGWEI, LIU HONGMIN, WANG XINPENG, FAN GUILIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a photoelectric sensor, a forming method thereof and electronic equipment, and the forming method comprises the steps: providing a substrate which is provided with a first surface; the substrate comprises a pixel region, and the pixel region comprises a plurality of sub-pixel regions arranged in an array; a plurality of photosensitive units are formed in the substrate, and the area where the photosensitive units are located is a sub-pixel area; forming a light trapping groove in the first surface of the substrate, wherein the light trapping groove is located in the sub-pixel region; forming an isolation groove in the substrate of partial thickness between the adjacent sub-pixel regions; forming a conformal dielectric layer in the light trapping groove and the isolation groove; and filling an isolation structure in the isolation groove in which the conformal dielectric layer is formed. According to the embodiment of the invention, after the light trapping groove and the isolation groove