Systems and methods for monitoring delivery of precursors to processing chamber

A semiconductor processing method utilizing a carrier gas and a semiconductor processing system to monitor a precursor dose from a solid or liquid source is disclosed. The pressure or mass flow controller is used for monitoring the flow of carrier gas entering the container, and the mass flow meter is used for measuring the total flow flowing out of the container. Based on the difference between these two flows, a precursor flow is obtained, and a dose of solid or liquid precursor to the processing chamber and a remaining amount in the source container are calculated. 公开了一种利用载气和半导体处理系统来监测来自固体或液体源的前体剂量的半导体处理方法。压力或质量流量控制器用于监测进入容器的载气流量，质量流量计用于测量流出容器的总流量。基于这两种流量之间的差异，获得前体流量，并且计算到处理室的固体或液体前体的剂量和源容器中的剩余量。