Hydrogen supply device and ion beam irradiation device provided with same
The present invention relates to a hydrogen supply device and an ion beam irradiation device provided with the same, and more particularly, to a hydrogen supply device capable of achieving stable hydrogen supply with a simple configuration. A hydrogen supply device (H) is disposed at a high potentia...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The present invention relates to a hydrogen supply device and an ion beam irradiation device provided with the same, and more particularly, to a hydrogen supply device capable of achieving stable hydrogen supply with a simple configuration. A hydrogen supply device (H) is disposed at a high potential and is provided with a bottle (7) having a hydrogen storage alloy therein.
本发明涉及氢供给装置及具备其的离子束照射装置，尤其涉及一种能够以简单的构成来实现呈稳定的氢供给的氢供给装置。一种氢供给装置(H)，被配置于高电位，且具备：于内部具有储氢合金的瓶子(7)。 |
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