SUBSTRATE CARRIER, FILM FORMING APPARATUS, FILM FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The invention relates to a substrate carrier, a film forming apparatus, a film forming method, and a method for manufacturing an electronic device. When an aligned substrate and a mask are integrally conveyed, the relative position deviation between the substrate and the mask during conveying can be...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUZUKI KENTARO, MISAWA KEITA, SATO SEIJI, NAGATA TETSUYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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