SUBSTRATE CARRIER, FILM FORMING APPARATUS, FILM FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The invention relates to a substrate carrier, a film forming apparatus, a film forming method, and a method for manufacturing an electronic device. When an aligned substrate and a mask are integrally conveyed, the relative position deviation between the substrate and the mask during conveying can be inhibited. A substrate carrier (9) for a vapor deposition apparatus is provided with: a substrate holding member that holds a substrate; and a support body (33c ') which is provided on a side parallel to the conveyance direction of an outer peripheral portion surrounding the outer periphery of the held substrate and which is conveyed in a state in which the substrate is placed on a mask (6) across the support body (33c'), characterized in that the substrate carrier (9) is supported by the support body (33c ') in the vicinity of the center of the side parallel to the conveyance direction, whereby the substrate carrier (9) is supported by the support body (33c') in the vicinity of the center of the side parallel to