Efficient etching equipment for silicon carbide wafer

The invention relates to efficient silicon carbide wafer etching equipment which comprises a silicon carbide wafer etching tool and an automatic feeding device, a plurality of tray components arranged at intervals are arranged on a rotary tool hanging column of the silicon carbide wafer etching tool in the vertical direction, and a plurality of tray cantilevers are annularly arranged on the periphery of a tray frame of each tray component. A tray groove is formed in an etching tray on the tray cantilever, a plurality of feeding components which are arranged at intervals are arranged on a rotary feeding stand column of the automatic feeding device in the vertical direction, and feeding suction cups are arranged at the two ends of a feeding cantilever of each feeding component; the station of the feeding suction cup at one end of the feeding cantilever corresponding to the height position of the etching tray is arranged above the tray groove of the etching tray, and the station of the feeding suction cup at the