Method and device for preparing high-purity trisilyl amine
The invention provides a method and a device for preparing high-purity trimethylsilyl amine, which are characterized in that after monochlorosilane and an alkane solvent are mixed at low temperature, a four-in-one reactor integrating intelligent temperature control, stirring, heating and closed filt...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a method and a device for preparing high-purity trimethylsilyl amine, which are characterized in that after monochlorosilane and an alkane solvent are mixed at low temperature, a four-in-one reactor integrating intelligent temperature control, stirring, heating and closed filtration is adopted for reaction to obtain crude trimethylsilyl amine; and finally, carrying out reduced pressure rectification by using a rectifying tower to obtain high-purity trisilylamine. According to the invention, the monochlorosilane and the alkane solvent are mixed at a low temperature, and then the mixture is stirred and reacted at a low temperature in the four-in-one reactor, so that local thermal aggregation is effectively avoided, and side reactions of synthesis are reduced; the closed filtering unit is a part of the four-in-one reactor, so that the transfer link of materials in air is reduced, and the risk of introducing impurities is reduced; by adopting the four-in-one reactor integrating intelligent |
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