Cleaning brush, substrate processing apparatus, and substrate processing method

The invention relates to a cleaning brush, a substrate processing apparatus and a substrate processing method. Provided is a technique for uniformly cleaning an adsorption surface of a chuck using a cleaning brush. And the cleaning brush is used for cleaning the adsorption surface of the chuck. The cleaning brush is provided with: a brush base that extends linearly outward in the radial direction from the rotation center line of the chuck; and a plurality of contact parts which protrude from the brush base and are in contact with the adsorption surface. When viewed from a direction orthogonal to the suction surface, a plurality of rows comprising a plurality of the contact portions arranged at intervals in a first direction are provided at intervals in a second direction intersecting the first direction. The second direction is the length direction of the brushing table. The cleaning brush is provided with a swing part. The swing portion swings the brush table such that a movement distance of each of the cont