Hot-workable low-emissivity glass and preparation method thereof

The invention relates to hot-workable low-emissivity glass and a preparation method, the glass comprises a glass substrate and a coating layer, the coating layer is sequentially compounded with a first dielectric layer, a first functional layer, a second dielectric layer, a first AZO layer, a first...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIANG GAN, LYU YICHAO, YU GONGWEN, MI YONGJIANG, WANG JIANG, PU JUN, YU HUAJUN, LI KUI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to hot-workable low-emissivity glass and a preparation method, the glass comprises a glass substrate and a coating layer, the coating layer is sequentially compounded with a first dielectric layer, a first functional layer, a second dielectric layer, a first AZO layer, a first protective layer, a second functional layer, a second protective layer, a second AZO layer and a third dielectric layer from the glass substrate to the outside; the first dielectric layer, the second dielectric layer and the third dielectric layer are one or more of a SiNx layer, a SiOx layer and a SiNxOy layer; the first functional layer is a Cu layer, and the second functional layer is an Ag layer. According to the glass provided by the invention, Cu with lower cost is used as the first functional layer, and the first dielectric layer and the second dielectric layer are used for protecting the two sides of the first functional layer, so that the use of oxides is reduced, and the damage to the first functional lay