System and method for rejuvenating skin using impedance monitoring

The present disclosure relates, in part, to methods of cosmetic tissue treatment. The method comprises disposing a treatment applicator comprising an electrode array comprising a plurality of needles, each needle being an electrode in electrical communication with a control system, on a portion of t...

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Bibliographische Detailangaben
Hauptverfasser: BOHL JOHANNES, MIRKOV MIKHAIL GRIGORIEVICH, MASSE DOMINIQUE, COUGHLIN JOHN, ALBERTELLI, CLAUDIO, BRUCE SARA, SONASHIN, DANIEL, SIMON, JU RG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present disclosure relates, in part, to methods of cosmetic tissue treatment. The method comprises disposing a treatment applicator comprising an electrode array comprising a plurality of needles, each needle being an electrode in electrical communication with a control system, on a portion of the tissue such that a region of the electrode array contacts the portion of the tissue; applying a radio frequency (RF) energy pulse to the portion of tissue through the electrode array; measuring the impedance of the electrode array over time; detecting a drop in the measured impedance when the electrode array is in contact with a portion of the tissue; and terminating application of the RF energy pulse after a processing period upon detecting an impedance reduction threshold. 本公开部分地涉及美容组织处理的方法。该方法包括将包括含有多根针的电极阵列的处理施用器设置在组织的部分上,使得电极阵列的区域接触组织的部分,其中,每根针是与控制系统电连通的电极;通过该电极阵列向组织的部分施加射频(RF)能量脉冲;测量电极阵列随时间推移的阻抗;检测电极阵列与组织的部分接触时所测量阻抗的下降;以及在检测到阻抗降低阈值时,在处理时间段之后终止施加所述RF能量脉冲。