Coated underlayer of overcoated photoresist
A method of forming a pattern, the method comprising applying a layer of a coating composition on a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer on the coated bottom layer; wherein the coating composition comprises a first material co...
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| creator | YAMADA, SHINTARO KE YOUSHENG CHAVEZ ANTHONY |
| description | A method of forming a pattern, the method comprising applying a layer of a coating composition on a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer on the coated bottom layer; wherein the coating composition comprises a first material comprising two or more hydroxyl groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.
一种形成图案的方法，该方法包括在衬底上施加涂料组合物层；将施加的涂料组合物固化以形成经涂覆的底层；以及在经涂覆的底层上形成光致抗蚀剂层；其中该涂料组合物包含包含两个或更多个羟基的第一材料；包含两个或更多个缩水甘油基的第二材料；包含受保护的氨基的添加剂；以及溶剂。 |
| format | Patent |
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一种形成图案的方法，该方法包括在衬底上施加涂料组合物层；将施加的涂料组合物固化以形成经涂覆的底层；以及在经涂覆的底层上形成光致抗蚀剂层；其中该涂料组合物包含包含两个或更多个羟基的第一材料；包含两个或更多个缩水甘油基的第二材料；包含受保护的氨基的添加剂；以及溶剂。</description><language>chi ; eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230110&DB=EPODOC&CC=CN&NR=115584177A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230110&DB=EPODOC&CC=CN&NR=115584177A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMADA, SHINTARO</creatorcontrib><creatorcontrib>KE YOUSHENG</creatorcontrib><creatorcontrib>CHAVEZ ANTHONY</creatorcontrib><title>Coated underlayer of overcoated photoresist</title><description>A method of forming a pattern, the method comprising applying a layer of a coating composition on a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer on the coated bottom layer; wherein the coating composition comprises a first material comprising two or more hydroxyl groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.
一种形成图案的方法，该方法包括在衬底上施加涂料组合物层；将施加的涂料组合物固化以形成经涂覆的底层；以及在经涂覆的底层上形成光致抗蚀剂层；其中该涂料组合物包含包含两个或更多个羟基的第一材料；包含两个或更多个缩水甘油基的第二材料；包含受保护的氨基的添加剂；以及溶剂。</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB2zk8sSU1RKM1LSS3KSaxMLVLIT1PIL0stSoZIFGTkl-QXpRZnFpfwMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4Zz9DQ1NTCxNDc3NHY2LUAACQuCnw</recordid><startdate>20230110</startdate><enddate>20230110</enddate><creator>YAMADA, SHINTARO</creator><creator>KE YOUSHENG</creator><creator>CHAVEZ ANTHONY</creator><scope>EVB</scope></search><sort><creationdate>20230110</creationdate><title>Coated underlayer of overcoated photoresist</title><author>YAMADA, SHINTARO ; KE YOUSHENG ; CHAVEZ ANTHONY</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115584177A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMADA, SHINTARO</creatorcontrib><creatorcontrib>KE YOUSHENG</creatorcontrib><creatorcontrib>CHAVEZ ANTHONY</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMADA, SHINTARO</au><au>KE YOUSHENG</au><au>CHAVEZ ANTHONY</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Coated underlayer of overcoated photoresist</title><date>2023-01-10</date><risdate>2023</risdate><abstract>A method of forming a pattern, the method comprising applying a layer of a coating composition on a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer on the coated bottom layer; wherein the coating composition comprises a first material comprising two or more hydroxyl groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.
一种形成图案的方法，该方法包括在衬底上施加涂料组合物层；将施加的涂料组合物固化以形成经涂覆的底层；以及在经涂覆的底层上形成光致抗蚀剂层；其中该涂料组合物包含包含两个或更多个羟基的第一材料；包含两个或更多个缩水甘油基的第二材料；包含受保护的氨基的添加剂；以及溶剂。</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Coated underlayer of overcoated photoresist |
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