Coated underlayer of overcoated photoresist

A method of forming a pattern, the method comprising applying a layer of a coating composition on a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer on the coated bottom layer; wherein the coating composition comprises a first material comprising two or more hydroxyl groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent. 一种形成图案的方法，该方法包括在衬底上施加涂料组合物层；将施加的涂料组合物固化以形成经涂覆的底层；以及在经涂覆的底层上形成光致抗蚀剂层；其中该涂料组合物包含包含两个或更多个羟基的第一材料；包含两个或更多个缩水甘油基的第二材料；包含受保护的氨基的添加剂；以及溶剂。