Temperature measurement wafer, implementation method thereof and temperature measurement system

The invention provides a temperature measurement wafer, an implementation method thereof and a temperature measurement system, and the temperature measurement wafer comprises a wafer body, the surface of the wafer body is provided with a continuous wire duct, and the wire duct is provided with a wir...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CAO XIAOGUANG, LI FENG, SHAO QIUXIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a temperature measurement wafer, an implementation method thereof and a temperature measurement system, and the temperature measurement wafer comprises a wafer body, the surface of the wafer body is provided with a continuous wire duct, and the wire duct is provided with a wire duct inlet end and a wire duct outlet end at the peripheral edge of the wafer body; and the grating optical fiber is provided with a plurality of gratings with preset sizes, the grating optical fiber is embedded into the trunking, is led in from the inlet end of the trunking and is led out from the outlet end of the trunking, and the size of the grating optical fiber is matched with the size of the trunking. According to the test wafer, a new wafer temperature measurement mode is provided, and the temperature of the wafer body can be measured with high precision by embedding the grating fiber into the wafer body, so that the temperature measurement result is closer to the actual temperature of the wafer body; the