LIQUID SUPPLY DEVICE AND POLISHING APPARATUS
The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portio...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | TAMURA MOTONARI ISOBE SOICHI SHINKAI TAKESHI YAMAGUCHI KUNIAKI MOCHIDA YUSUKE |
description | The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portion of the second arm, and a first rotation drive unit rotating the first rotation shaft to cause the first arm to rotate from a fluid supply position to a retracted position. A second rotation drive unit that rotates the second rotation shaft to cause the second arm to rotate from the fluid supply position to the retracted position; and a control unit. The first rotating shaft and the second rotating shaft are arranged coaxially with each other. The control unit can control the operation of the first rotation drive unit and the operation of the second rotation drive unit independently of each other.
本发明是一种液体供给装置及研磨装置,液体供给装置具备:具有第1喷嘴的第1臂、具有第2喷嘴的第2臂、支承第1臂的基端部的第1旋转轴、支承第2臂的基端部的第2旋转轴、通过使第1旋转轴旋转而使第1臂从流体供给位置旋绕至退避位置的第1旋转驱动部 |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN115533756A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN115533756A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN115533756A3</originalsourceid><addsrcrecordid>eNrjZNDx8QwM9XRRCA4NCPCJVHBxDfN0dlVw9HNRCPD38Qz28PRzV3AMCHAMcgwJDeZhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoaGpqbGxuamZo7GxKgBAKR1JVE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LIQUID SUPPLY DEVICE AND POLISHING APPARATUS</title><source>esp@cenet</source><creator>TAMURA MOTONARI ; ISOBE SOICHI ; SHINKAI TAKESHI ; YAMAGUCHI KUNIAKI ; MOCHIDA YUSUKE</creator><creatorcontrib>TAMURA MOTONARI ; ISOBE SOICHI ; SHINKAI TAKESHI ; YAMAGUCHI KUNIAKI ; MOCHIDA YUSUKE</creatorcontrib><description>The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portion of the second arm, and a first rotation drive unit rotating the first rotation shaft to cause the first arm to rotate from a fluid supply position to a retracted position. A second rotation drive unit that rotates the second rotation shaft to cause the second arm to rotate from the fluid supply position to the retracted position; and a control unit. The first rotating shaft and the second rotating shaft are arranged coaxially with each other. The control unit can control the operation of the first rotation drive unit and the operation of the second rotation drive unit independently of each other.
本发明是一种液体供给装置及研磨装置,液体供给装置具备:具有第1喷嘴的第1臂、具有第2喷嘴的第2臂、支承第1臂的基端部的第1旋转轴、支承第2臂的基端部的第2旋转轴、通过使第1旋转轴旋转而使第1臂从流体供给位置旋绕至退避位置的第1旋转驱动部</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221230&DB=EPODOC&CC=CN&NR=115533756A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221230&DB=EPODOC&CC=CN&NR=115533756A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAMURA MOTONARI</creatorcontrib><creatorcontrib>ISOBE SOICHI</creatorcontrib><creatorcontrib>SHINKAI TAKESHI</creatorcontrib><creatorcontrib>YAMAGUCHI KUNIAKI</creatorcontrib><creatorcontrib>MOCHIDA YUSUKE</creatorcontrib><title>LIQUID SUPPLY DEVICE AND POLISHING APPARATUS</title><description>The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portion of the second arm, and a first rotation drive unit rotating the first rotation shaft to cause the first arm to rotate from a fluid supply position to a retracted position. A second rotation drive unit that rotates the second rotation shaft to cause the second arm to rotate from the fluid supply position to the retracted position; and a control unit. The first rotating shaft and the second rotating shaft are arranged coaxially with each other. The control unit can control the operation of the first rotation drive unit and the operation of the second rotation drive unit independently of each other.
本发明是一种液体供给装置及研磨装置,液体供给装置具备:具有第1喷嘴的第1臂、具有第2喷嘴的第2臂、支承第1臂的基端部的第1旋转轴、支承第2臂的基端部的第2旋转轴、通过使第1旋转轴旋转而使第1臂从流体供给位置旋绕至退避位置的第1旋转驱动部</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDx8QwM9XRRCA4NCPCJVHBxDfN0dlVw9HNRCPD38Qz28PRzV3AMCHAMcgwJDeZhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoaGpqbGxuamZo7GxKgBAKR1JVE</recordid><startdate>20221230</startdate><enddate>20221230</enddate><creator>TAMURA MOTONARI</creator><creator>ISOBE SOICHI</creator><creator>SHINKAI TAKESHI</creator><creator>YAMAGUCHI KUNIAKI</creator><creator>MOCHIDA YUSUKE</creator><scope>EVB</scope></search><sort><creationdate>20221230</creationdate><title>LIQUID SUPPLY DEVICE AND POLISHING APPARATUS</title><author>TAMURA MOTONARI ; ISOBE SOICHI ; SHINKAI TAKESHI ; YAMAGUCHI KUNIAKI ; MOCHIDA YUSUKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115533756A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TAMURA MOTONARI</creatorcontrib><creatorcontrib>ISOBE SOICHI</creatorcontrib><creatorcontrib>SHINKAI TAKESHI</creatorcontrib><creatorcontrib>YAMAGUCHI KUNIAKI</creatorcontrib><creatorcontrib>MOCHIDA YUSUKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAMURA MOTONARI</au><au>ISOBE SOICHI</au><au>SHINKAI TAKESHI</au><au>YAMAGUCHI KUNIAKI</au><au>MOCHIDA YUSUKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LIQUID SUPPLY DEVICE AND POLISHING APPARATUS</title><date>2022-12-30</date><risdate>2022</risdate><abstract>The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portion of the second arm, and a first rotation drive unit rotating the first rotation shaft to cause the first arm to rotate from a fluid supply position to a retracted position. A second rotation drive unit that rotates the second rotation shaft to cause the second arm to rotate from the fluid supply position to the retracted position; and a control unit. The first rotating shaft and the second rotating shaft are arranged coaxially with each other. The control unit can control the operation of the first rotation drive unit and the operation of the second rotation drive unit independently of each other.
本发明是一种液体供给装置及研磨装置,液体供给装置具备:具有第1喷嘴的第1臂、具有第2喷嘴的第2臂、支承第1臂的基端部的第1旋转轴、支承第2臂的基端部的第2旋转轴、通过使第1旋转轴旋转而使第1臂从流体供给位置旋绕至退避位置的第1旋转驱动部</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN115533756A |
source | esp@cenet |
subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
title | LIQUID SUPPLY DEVICE AND POLISHING APPARATUS |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T07%3A59%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TAMURA%20MOTONARI&rft.date=2022-12-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN115533756A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |