LIQUID SUPPLY DEVICE AND POLISHING APPARATUS

The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portio...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAMURA MOTONARI, ISOBE SOICHI, SHINKAI TAKESHI, YAMAGUCHI KUNIAKI, MOCHIDA YUSUKE
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The invention relates to a liquid supply device and a grinding device. The liquid supply device includes a first arm having a first nozzle, a second arm having a second nozzle, a first rotation shaft supporting a base end portion of the first arm, a second rotation shaft supporting a base end portion of the second arm, and a first rotation drive unit rotating the first rotation shaft to cause the first arm to rotate from a fluid supply position to a retracted position. A second rotation drive unit that rotates the second rotation shaft to cause the second arm to rotate from the fluid supply position to the retracted position; and a control unit. The first rotating shaft and the second rotating shaft are arranged coaxially with each other. The control unit can control the operation of the first rotation drive unit and the operation of the second rotation drive unit independently of each other. 本发明是一种液体供给装置及研磨装置,液体供给装置具备:具有第1喷嘴的第1臂、具有第2喷嘴的第2臂、支承第1臂的基端部的第1旋转轴、支承第2臂的基端部的第2旋转轴、通过使第1旋转轴旋转而使第1臂从流体供给位置旋绕至退避位置的第1旋转驱动部