Semiconductor manufacturing system and method for generating extreme ultraviolet radiation in manufacturing system thereof

A semiconductor manufacturing system and method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system, in a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system, one or more streams of gas are directed through one or mor...

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Bibliographische Detailangaben

Hauptverfasser:	CHIEN SHANGIEH, YU SHENGGANG, XU ZHEZHANG, LIU HENGXIN, CHEN LIRUI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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