Reduced photomask housing, compartment, and method of handling
A magnification reticle housing, a compartment and a method of handling, the magnification reticle housing comprising: a base comprising a first surface; the cover comprises a second surface and is arranged on the base, an internal space is formed between the base and the cover, and the internal spa...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A magnification reticle housing, a compartment and a method of handling, the magnification reticle housing comprising: a base comprising a first surface; the cover comprises a second surface and is arranged on the base, an internal space is formed between the base and the cover, and the internal space comprises a double light shrinking mask; and an electrostatic discharge material layer disposed on the first surface, wherein the electrostatic discharge material reduces electrostatic charges on the magnification photomask.
一种倍缩光罩外壳、舱以及处置的方法,倍缩光罩外壳包括:一基座,该基座包括一第一表面;一盖,该盖包括一第二表面且设置于该基座上,其中该基座及该盖在之间形成一内部空间,该内部空间包括一倍缩光罩;及设置于该第一表面上的一静电放电材料层,其中该静电放电材料减小该倍缩光罩上的静电电荷。 |
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