Semiconductor processing tool and exhaust system thereof

The invention provides a semiconductor processing tool and an exhaust system thereof. The semiconductor processing tool may include a processing tank. The semiconductor processing tool may include an arm arranged to hold the plurality of wafers over the processing tank such that wafers of the plural...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIAN GUOSHENG, CHEN YONGHE
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a semiconductor processing tool and an exhaust system thereof. The semiconductor processing tool may include a processing tank. The semiconductor processing tool may include an arm arranged to hold the plurality of wafers over the processing tank such that wafers of the plurality of wafers are horizontally stacked over the processing tank. The semiconductor processing tool may include a fan disposed above the arm to allow airflow through the wafer surface to be provided to the processing tank in a vertical direction. The semiconductor processing tool may include an exhaust system including at least one exhaust gas output and one or more exhaust pipe segments disposed substantially around the processing slot and connected to the at least one exhaust gas output. The one or more exhaust pipe sections may include a plurality of openings to receive exhaust gas to be provided to the at least one exhaust gas output. In this way, the semiconductor processing tool and the exhaust system can redu