Inductively coupled plasma source gas supply system with early warning function
The invention discloses an inductively coupled plasma source gas supply system with an early warning function, which comprises a first gas cylinder, a first pressure stabilizing valve, a first mass flow controller, a second mass flow controller, a third mass flow controller, a first digital pressure...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses an inductively coupled plasma source gas supply system with an early warning function, which comprises a first gas cylinder, a first pressure stabilizing valve, a first mass flow controller, a second mass flow controller, a third mass flow controller, a first digital pressure gauge, a second digital pressure gauge, a controller and an atomizer, wherein high-pressure and high-purity argon is stored in the first gas cylinder, the first pressure stabilizing valve is connected with a gas outlet of the first gas cylinder, and the first pressure stabilizing valve is used for reducing and stabilizing the pressure of the high-pressure and high-purity argon output by the first gas cylinder; the output end of the first pressure stabilizing valve is connected with the first mass flow controller, the second mass flow controller, the third mass flow controller and the first digital pressure gauge; the controller is connected with the first mass flow controller, the second mass flow controller, the |
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