Etching liquid supply method, etching liquid supply device and etching equipment

The invention relates to an etching liquid supply method, an etching liquid supply device and etching equipment. The etching liquid supply method comprises the following steps: acquiring a replacement state of etching liquid in an acid tank; after the etching liquid is replaced every time, the seque...

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Bibliographische Detailangaben
Hauptverfasser: TU CHENGLIN, ZHANG YONGCANG, HAO LILAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to an etching liquid supply method, an etching liquid supply device and etching equipment. The etching liquid supply method comprises the following steps: acquiring a replacement state of etching liquid in an acid tank; after the etching liquid is replaced every time, the sequence number of a production batch is collected; and according to the sequence number of the production batch, obtaining a corresponding liquid supplementing preset volume, and supplementing liquid to the acid tank according to the liquid supplementing preset volume. According to the etching liquid supply method, the etching liquid supply device and the etching equipment, the production efficiency of a production line and the product yield can be improved, and the production cost can be reduced. 本申请涉及一种刻蚀液补给方法及补给装置、刻蚀设备。所述刻蚀液补给方法,包括:获取酸槽内刻蚀液的更换状态;于每次更换所述刻蚀液之后,采集生产批次的顺序号;根据生产批次的顺序号,获取对应的补液预设容积,并根据所述补液预设容积对所述酸槽进行补液。所述刻蚀液补给方法及补给装置、刻蚀设备,可以提高产线生产效率、产品良品率及降低生产成本。