Reduction furnace regulation and control method and device and related equipment
The invention provides a reduction furnace regulation and control method and device and related equipment.The regulation and control method comprises the steps that a first target parameter is obtained, and the first target parameter is used for representing the current silicon powder content of a r...
Gespeichert in:
Hauptverfasser: | , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention provides a reduction furnace regulation and control method and device and related equipment.The regulation and control method comprises the steps that a first target parameter is obtained, and the first target parameter is used for representing the current silicon powder content of a reduction furnace; determining first deviation information according to the difference between the reference silicon powder content and the first target parameter; according to the first deviation information, influence factors of the reduction furnace are regulated and controlled, and the influence factors comprise at least one of the input quantity of input raw materials of the reduction furnace and the current value of the reduction furnace. A manual regulation mode is replaced by an automatic regulation mode of acquiring the current silicon powder content of the reduction furnace, comparing the difference between the silicon powder content and the reference silicon powder content, determining the first deviation |
---|