Thin film deposition apparatus and thin film deposition method

Disclosed are a thin film deposition apparatus and a thin film deposition method, the thin film deposition apparatus comprising: a reaction vessel having a vacuum chamber, the reaction vessel being internally provided with a support capable of holding a substrate on a holding surface; the evaporatio...

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Hauptverfasser: JIANG YOUSONG, YANG YUN, WANG HUAIMIN, GU KANGXIN, ZHENG BINGWEI, DONG CHANGHAI
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creator JIANG YOUSONG
YANG YUN
WANG HUAIMIN
GU KANGXIN
ZHENG BINGWEI
DONG CHANGHAI
description Disclosed are a thin film deposition apparatus and a thin film deposition method, the thin film deposition apparatus comprising: a reaction vessel having a vacuum chamber, the reaction vessel being internally provided with a support capable of holding a substrate on a holding surface; the evaporation coating mechanism is arranged in the vacuum cavity and is used for carrying out evaporation coating on the substrate, and the evaporation coating mechanism is arranged towards the holding surface; the sputter coating mechanism is arranged in the vacuum cavity and used for carrying out sputter coating on the substrate, and the sputter coating mechanism is arranged towards the holding surface; wherein the evaporation coating mechanism and the sputter coating mechanism are positioned on the same side of the bracket; the minimum distance between the sputter coating mechanism and the support is smaller than 20 cm and larger than 5 cm. According to the thin film deposition device and the thin film deposition method, ev
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Thin film deposition apparatus and thin film deposition method
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