Substrate processing apparatus, substrate processing method, learning data generation method, learning method, learning apparatus, learning completion model generation method, and learning completion model

This substrate processing apparatus (100) is provided with a substrate holding unit (120), a chemical solution supply unit (130), a substrate information acquisition unit (22a), a chemical solution processing condition information acquisition unit (22b), and a control unit (22). A substrate information acquisition unit (22a) acquires substrate information including hardened layer thickness information indicating the thickness of a hardened layer in a resist layer of a substrate to be processed or ion implantation condition information indicating the condition of ion implantation for forming the hardened layer in the resist layer. A chemical solution processing condition information acquisition unit (22b) acquires chemical solution processing condition information indicating a chemical solution processing condition for the substrate to be processed on the basis of the substrate information and the self-learning completion model. The control unit (22) controls the substrate holding unit (120) and the chemical s